JPH0588544B2 - - Google Patents
Info
- Publication number
- JPH0588544B2 JPH0588544B2 JP61247531A JP24753186A JPH0588544B2 JP H0588544 B2 JPH0588544 B2 JP H0588544B2 JP 61247531 A JP61247531 A JP 61247531A JP 24753186 A JP24753186 A JP 24753186A JP H0588544 B2 JPH0588544 B2 JP H0588544B2
- Authority
- JP
- Japan
- Prior art keywords
- gate electrode
- polycrystalline silicon
- recrystallized
- island
- laser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
Landscapes
- Recrystallisation Techniques (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61247531A JPS63102265A (ja) | 1986-10-20 | 1986-10-20 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61247531A JPS63102265A (ja) | 1986-10-20 | 1986-10-20 | 半導体装置の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63102265A JPS63102265A (ja) | 1988-05-07 |
JPH0588544B2 true JPH0588544B2 (en]) | 1993-12-22 |
Family
ID=17164884
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61247531A Granted JPS63102265A (ja) | 1986-10-20 | 1986-10-20 | 半導体装置の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63102265A (en]) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5485019A (en) * | 1992-02-05 | 1996-01-16 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for forming the same |
US6700133B1 (en) | 1994-03-11 | 2004-03-02 | Semiconductor Energy Laboratory Co., Ltd. | Method for producing semiconductor device |
JP3469337B2 (ja) * | 1994-12-16 | 2003-11-25 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
US5817548A (en) * | 1995-11-10 | 1998-10-06 | Sony Corporation | Method for fabricating thin film transistor device |
JP4084039B2 (ja) * | 2001-11-19 | 2008-04-30 | 株式会社 液晶先端技術開発センター | 薄膜半導体装置及びその製造方法 |
CN100559073C (zh) * | 2005-04-08 | 2009-11-11 | 东芝照明技术株式会社 | 灯 |
JP4849305B2 (ja) * | 2005-04-08 | 2012-01-11 | 東芝ライテック株式会社 | 電球型ランプ |
US7758223B2 (en) | 2005-04-08 | 2010-07-20 | Toshiba Lighting & Technology Corporation | Lamp having outer shell to radiate heat of light source |
JP4569683B2 (ja) | 2007-10-16 | 2010-10-27 | 東芝ライテック株式会社 | 発光素子ランプ及び照明器具 |
JP5353216B2 (ja) | 2008-01-07 | 2013-11-27 | 東芝ライテック株式会社 | Led電球及び照明器具 |
JP5601512B2 (ja) | 2009-09-14 | 2014-10-08 | 東芝ライテック株式会社 | 発光装置および照明装置 |
CN119654696A (zh) * | 2022-08-01 | 2025-03-18 | 三井化学株式会社 | 基板层叠体的制造方法及半导体装置 |
-
1986
- 1986-10-20 JP JP61247531A patent/JPS63102265A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS63102265A (ja) | 1988-05-07 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |